Chipmakers are pushing into sub-threshold operation in an effort to prolong battery life and reduce energy costs, adding a whole new set of challenges for design teams. While process and environmental ...
A new methodology to assess the impact of fabrication inherent process variability on 14-nm fin field effect transistor (FinFET) device performance. August 18th, 2021 - By: Coventor A new methodology ...
San Mateo, Calif. – Process integration engineers are gradually losing their battle to keep process variations hidden behind the defensive barrier of tight design rules. Variations in metal line ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback